Microstructural Evolution Of TiC/a-C
Nanocomposite Coatings With Pulsed
Magnetron Sputtering
Author(s)
Y. T. Pei, K. P. Shaha, C. Q. Chen, J. Th. M. De Hosson,
J. W. Bradley, S. Voronin & M. Cada
Abstract
The microstructure and property of magnetron sputtered coatings are strongly
affected by the intensity of concurrent ion impingement, in particular, by the
energy distribution of impinging ions and the flux ratio between impinging ions
and depositing atoms. In this paper, we report some striking results in the
microstructure manipulation and residual stress control of TiC/a-C
nanocomposite coatings with pulsed-DC magnetron sputtering. Ion mass/energy
spectrometry of plasma diagnostics reveals that, depending on the waveform,
frequency and width of pulses, pulsing the magnetrons can control the flux and
energy distribution of Ar+ ions over a very broad range, in comparison with DC
sputtering. The latter delivers only low energy Ar+ ions and also less flux. With
increasing pulse frequency, the nanocomposite coatings exhibit evolutions in the
morphology of growing interface from rough to smooth and in the microstructure
from strongly columnar to non-columnar. AFM, SEM, HR-TEM and
nanoindentation are employed to characterize the deposited coatings, supported
with plasma diagnostic experiments for a better understanding of the pulsed
sputtering process.
Keywords: pulsed magnetron sputtering, ion energy distribution, plasma
diagnostics, microstructural evolution, nanocomposite coating.
Keywords
pulsed magnetron sputtering, ion energy distribution, plasma
diagnostics, microstructural evolution, nanocomposite coating.
Related Book
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